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DuPont Photomasks: 0.18 microns – yes or no?

The American DuPont Photomasks (DPI) today announced its plans to build the first line in China for the production of 0.18 micron lithographic photo masks. For these purposes, the newest complex of laser generation of templates from Applied Materials will be purchased. With this move, the company wants to expand its existing factory in China.

And everything would be fine, if not for one “but”: the US government has established export controls on high-tech lithographic equipment. The limit is now 0.25 microns of the norm.

Although the financial prospects in China are huge, plus the country is included in the WTO, while there is a debate about the supply of the most modern equipment to China. Despite these restrictions, many companies intend to move 0.18 micron production to China in the next year or two.

DuPont will begin licensing equipment for removal in the second quarter of this year. I wonder if the company will be allowed to take out the equipment or not.

Source: Silicon Strategies

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