Slimdx runtime net 2.0.Slimdx runtime .net 2.0


Slimdx runtime net 2.0


Navigation menu.[SlimDX] Deploying with VS and .net – Graphics and GPU Programming –


This is no longer the case; we have decided to follow the same model as the DirectX team and produce a redistributable runtime and a Developer SDK. SlimDX SDK package includes all of the binaries. Website updates for Jan 12 release. with additions and 4 deletions. The January release of SlimDX is now out! The January release was a minor stability release. Once again this release does not reflect a corresponding release of the DirectX SDK. SlimDX is an open-source API to DirectX programming can be used from any language under runtime (due to the CLR).. SlimDX can be used to develop multimedia and interactive applications (e.g. games).Enabling high performance graphical representation and enabling the programmer to make use of modern graphical hardware while working inside .


Slimdx runtime net 2.0.Download slimdx runtime .net for free (Windows)

Apr 29,  · SlimDX x86 (January ) It is designed to be an efficient, simple, and lean wrapper (5 votes) (See all)3/5(5). Feb 01,  · SlimDX (January ) lies within Development Tools, more precisely IDE. The following version: is the most frequently downloaded one by the program users. The most frequent installation filename for the software is: thexe. The actual developer of the free program is SlimDX . Trusted Windows (PC) download SlimDX (January ) Virus-free and % clean download. Get SlimDX (January ) alternative downloads.
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ASML will present its vision of lithography at SPIE

At the SPIE microlithography conference (from March 3rd to 8th in. Santa Clara), Dutch ASML is going to show its new developments in the field of EUV lithography.

ASML is going to show what lithography is “in a European way” – the report will be co-authored by Carl Zeiss, Sagem and Xenocs. They called their EUV initiative Extatic (theEXTreme Ultraviolet Alpha Tool Integration Consortium).

The purpose of the joint presentation at the conference will be to show that the European EUV technology is applicable for <0,05 мкм процессов.

A bit contradictory – after all, ASML should become a “system integrator” for the American EUV consortium EUV LLC (Advanced Micro Devices, IBM, Infineon, Intel, Micron, Motorola, laboratories of the US Department of Energy). I think that ASML at the conference will clarify this situation.

Recall that Japanese Nikon and Canon are developing EUV equipment on their own. Nikon is also working with IBM in parallel to develop EPL electronic projection lithography.

However, at SPIE, companies involved in one way or another with the development of next generation lithography devices will speak and report on their plans in much more detail.

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