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193 nm to the limit!
The IMEC research group has announced its intention to develop technologies and devices that allow the use of 193 nm lithography for the production of ICs at rates well below 0.1 μm. This is the right direction for research work, according to most analysts. Indeed, despite the fact that the wavelength of 157 nm seems to be not far from being embodied in real lithographic installations, many elements of lithography using 157 nm have not yet been finalized. For example, you will need very high quality lenses with an ultra-high numerical aperture, new resist formulas, etc.d.
As we have already noted, the International Technology Roadmap for Semiconductors (ITRS) implies a transition to 157 nm equipment closer to 2021, with the introduction of a 0.065 micron technical process.
Until that time, it is necessary to adapt 193 nm to work with resolutions of 0.09 – 0.07 microns, which is what IMEC is going to do.
The study will use an ASML PAS5500 / 1100 step scan unit connected to the coverage line with an ACT8 resist from Tokyo Electron. All this will be installed on a pilot 200 mm IMEC conveyor.
IMEC itself invites all companies directly related to the production / development of lithographic and related equipment to participate in the program.